Personal Biography

Mainly engaged in wafer photoresist stripping, wafer lift-off, wafer impurity cleaning, wafer film layer removal, and post-cleaning spin-drying. Responsible for developing and refining batch impurity and film removal processes for wafers, advancing process development and chip fabrication.

Education Background

2021.09–2025.06 Shenzhen University, Chemistry

Working Experience

2025.07–Present Shenzhen International Quantum Academy, Engineer